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Organisation: JGU > Faculty 08 > Institute of Physics > Group Experimental Particle & Astroparticle Physics (ETAP) > AG XY
Research: JGU > Faculty 08 > Physics > Astroparticle & Neutrino Physics > AG XY

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Autoren: Name 01, Name 02, Name 03, Name 04, Name 05

2020

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Autoren: Name 01, Name 02, Name 03, Name 04, Name 05

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Autoren: Name 01, Name 02, Name 03, Name 04, Name 05

2020

Autoren: Name 01, Name 02, Name 03, Name 04, Name 05

2020

Autoren: Name 01, Name 02, Name 03, Name 04, Name 05

2020

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For patterning of our thin films and nanostructures we run a clean room of class 100.

The supporting infrastructure consists of a water purification system, a pure gases installation, a photo resist spinner, a wet bench, an UV-exposure system using Hg i-line, an inspection microscope, a photo resist ashing system, an ion etching system, a wire bonder.

In order to achieve structure sizes below one micrometer we use an electron beam lithography or a focused ion beam lithography. The electron beam lithography uses the finely focussed electron beam for exposure of the resist material. The ion beam can directly remove material of the thin film using high energy Ga ions. The electron microscope also serves for material characterization with respect to the surface morphology and the film stoichiometry using energy dispersive x-ray analysis (EDX).

For patterning of our thin films and nanostructures we run a clean room of class 100.

The supporting infrastructure consists of a water purification system, a pure gases installation, a photo resist spinner, a wet bench, an UV-exposure system using Hg i-line, an inspection microscope, a photo resist ashing system, an ion etching system, a wire bonder.

In order to achieve structure sizes below one micrometer we use an electron beam lithography or a focused ion beam lithography. The electron beam lithography uses the finely focussed electron beam for exposure of the resist material. The ion beam can directly remove material of the thin film using high energy Ga ions. The electron microscope also serves for material characterization with respect to the surface morphology and the film stoichiometry using energy dispersive x-ray analysis (EDX).

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  1. Aktuelle Themen aus der Teilchen- und Astroteilchenphysik
    Instructor: Univ.-Prof. Dr. Sebastian Böser; Univ.-Prof. Dr. Volker Büscher; apl. Prof. Dr. Frank Fiedler; Univ.-Prof. Dr. Lucia Masetti; Univ.-Prof. Dr. Uwe Gerd Oberlack; Dr. Christian Schmitt; Dr. Ulrich Schäfer; Dr. Duc Bao Ta; Univ.-Prof. Dr. Stefan Tapprogge; Dr. Rainer Wanke; Univ.-Prof. Dr. Michael Wurm
  2. Arbeitsgruppenseminar Detektorentwicklung seltene Zerfälle
    Instructor: Univ.-Prof. Dr. Sebastian Böser; Stefan Schoppmann; Prof. Dr. Alfons Weber; Univ.-Prof. Dr. Michael Wurm
  3. Arbeitsgruppenseminar über das IceCube Neutrinoteleskop am Südpol
    Instructor: Univ.-Prof. Dr. Sebastian Böser
  4. Arbeitsgruppenseminar zur Neutrinomassenmessung
    Instructor: Univ.-Prof. Dr. Sebastian Böser; Univ.-Prof. Dr. Martin Fertl
  5. Hochempfindliche Optische Sensoren für die Neutrinophysik
    Instructor: Univ.-Prof. Dr. Sebastian Böser
  6. Vertiefende Kapitel der Astroteilchen- und Astrophysik
    Instructor: Univ.-Prof. Dr. Sebastian Böser; Savitri Gallego

WiSe 2025/26

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For general inquiries regarding open research positions please contact contact@thisgroup.de

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